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SEMATECH and ISMI Presentations at SPIE Advanced Lithography 2010

At SPIE Advanced Lithography 2010, SEMATECH will discuss issues and solutions in preparing extreme ultraviolet lithography (EUVL) for high-volume manufacturing. The SPIE Advanced Lithography conference will take place February 21-25 in San Jose, CA. SEMATECH will show how they are enabling EUV mask and resist/materials infrastructure as well as EUVL manufacturing feasibility and affordability. The SEMATECH Lithography Program is based at the College of Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex.

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