The 2011 SEMATECH Knowledge Series (SKS) will discuss the challenges and technology developments in next-generation lithography, materials and methods to enhance transistor and back-end development, and ways to improve manufacturing efficiency and yield. The worldwide conferences, symposia, and workshops are designed to enhance global knowledge and collaboration in key areas of nanoelectronics R&D by providing technology forums to explore critical issues and build industry consensus.
The 2010 SEMATECH Knowledge Series (SKS) conferences will focus on difficult questions in lithography, advanced technologies, manufacturing, and strategy. Included are a new set of meetings on installed-base equipment utilization, and a new interconnect workshop in stress management for 3D chips utilizing through-silicon vias (TSVs). All SKS meetings are open to the public.