Tag Archives: PROVE

SEMATECH, Zeiss Develop PROVE Registration, Overlay Metrology System

Carl Zeiss Semiconductor Metrology Systems (SMS) division’s registration and overlay metrology system has successfully passed a key development milestone. The system, called PROVE, was developed by both SEMATECH and Carl Zeiss. The two companies demonstrated the measurement capability for advanced photomasks for the 32 nm node and below. In a series of test runs, 0.5 nm repeatability and 1.0 nm accuracy in image placement, registration and overlay measurement were verified.

Continue reading