Tag Archives: OPC

Synopsys Proteus LRC for Lithography Verification

Synopsys announced Proteus LRC (lithography rule check) for lithography verification. Proteus LRC is a post-optical proximity correction (OPC) verification tool. It enables fast and accurate hotspot detection across the process window for full-chip mask validation within the highly-scalable Proteus Pipeline Technology. Synopsys Proteus LRC is designed for 28-nanometer (nm) and below. It features OPC models and rigorous first-principle models from embedded Sentaurus Lithography technology. Proteus LRC is integrated into the Proteus Mask Synthesis flow.

Continue reading

OPC Training Courses

The OPC Training Institute (OPCTI) is offering several hands-on and theoretical courses. The training is ideal for professionals in the industrial, commercial, and military fields. OPCTI offers four progressive levels of training:

  • Level 1: OPC and DCOM Diagnostics
  • Level 2: OPC Security
  • Level 3: OPC Unified Architecture (OPC UA)
  • Level 4: Advanced OPC Projects

Continue reading