Tag Archives: Dual-Patterning-Compliant

Synopsys IC Compiler-Advanced Geometry for 20nm IC Implementation

Synopsys introduced IC Compiler-Advanced Geometry, which is a new configuration of their IC Compiler physical design product. IC Compiler-Advanced Geometry is a DPT-compliant place-and-route solution that will provide designers moving to 20 nanometers with an advanced solution. Synopsys has successfully collaborated with foundry partners and major customers to validate that IC Compiler is 20nm-ready.

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