Tag Archives: DPL

KLA-Tencor PROLITH X3.1 Virtual Lithography Tool

PROLITH X3.1, from KLA-Tencor, is a comprehensive toolset that addresses advanced lithography challenges. PROLITH X3.1 virtual lithography tool helps researchers quickly and cost-effectively troubleshoot challenging issues in EUV and double patterning lithography (DPL) processes, including line edge roughness (LER) and patterning issues associated with wafer topography. With PROLITH X3.1, lithographers can streamline research, conserve valuable lithography cell resources, and accelerate product development.

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