Tag Archives: Cleaning

SEMATECH Surface Preparation and Cleaning Conference

SEMATECH’s Surface Preparation and Cleaning Conference (SPCC) will feature advanced technologies for cleaning, measuring and processing new III-V semiconductor materials for volume wafer manufacturing. SPCC 2010 will focus on particle removal, including next-generation materials, controlling processes to minimize impact on fragile device structures, non-damaging methods to remove resist, and new metrology approaches for measuring passivation and surface defects. SPCC will take place March 22-24, 2010 at the Sheraton Austin Hotel.

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