Tag Archives: atomic layer deposition

Agilent, Stanford University Research Nanoscale Devices

Agilent Technologies and Stanford University are working on a research program designed to explore a new class of nanoscale devices using a combinations of the scanning probe microscope (SPM) and atomic layer deposition (ALD). The research will enable the rapid prototyping and characterization of nanoscale devices with breakthroughs in sub 10 nm scale for a wide range of applications. The work between Agilent and Stanford University is part of Agilent’s University Relations Program, which facilitates collaborations with universities around the world.

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