Tag Archives: 65nm

Magma, Virage Logic Reference Flow for GLOBAL FOUNDRIES 65nm Process

Magma Design Automation, GLOBALFOUNDRIES, and Virage Logic introduced a Unified Power Format (UPF)-compliant RTL-to-GDSII reference flow. The automated, comprehensive solution streamlines the design and manufacture of ICs that use Virage Logic’s intellectual property (IP) and are manufactured in GLOBALFOUNDRIES’ 65LPe 65-nanometer (nm) low-power process technology. The reference flow is available from Magma, GLOBALFOUNDRIES and Virage Logic upon request.

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SMIC-Cadence 65nm Low Power Reference Flow 4.0

Cadence Design Systems introduced a comprehensive low-power design flow for engineers targeting the 65-nanometer process at Semiconductor Manufacturing International Corporation (SMIC). Based on the Cadence Low-Power Solution, the flow enables faster design of leading-edge, low-power semiconductors using a single, comprehensive design platform. The SMIC-Cadence Reference Flow 4.0 addresses the need for power-efficient design innovation with an advanced, automated low-power design capability.

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