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'Design Flow' Category Archive

Magma, Virage Logic Reference Flow for GLOBAL FOUNDRIES 65nm Process

Posted by Ken Cheung in Design Flow,Foundry on Tuesday, June 15, 2010

Magma Design Automation, GLOBALFOUNDRIES, and Virage Logic introduced a Unified Power Format (UPF)-compliant RTL-to-GDSII reference flow. The automated, comprehensive solution streamlines the design and manufacture of ICs that use Virage Logic’s intellectual property (IP) and are manufactured in GLOBALFOUNDRIES’ 65LPe 65-nanometer (nm) low-power process technology. The reference flow is available from Magma, GLOBALFOUNDRIES and Virage [...]

Extreme DA GoldTime for Altos Variety and Liberate Models

Posted by Ken Cheung in Design Flow,Models, Simulations on Friday, June 11, 2010

Altos Design Automation and Extreme DA developed a signal-integrity (SI) design flow for integrated circuit (IC) designs manufactured at process nodes of 65-nanometers (nm) and below. Extreme DA GoldTime for use with Altos Variety and Liberate models is available now from Extreme DA. Pricing varies depending on configuration. Altos Variety and Liberate approved libraries for [...]

Nanometer IC Variation Analysis Design Flow

Posted by Ken Cheung in Design Flow on Wednesday, January 27, 2010

Berkeley Design Automatio and Solido Design Automation teamm on a validated flow for rapid reduction in variation risk in nanometer designs at the transistor level. In the solution, Variation Designer utilizes the AFS Platform. The result is variation analysis capabilities that enable designers to rapidly reduce variation risk.

Calypto Design Systems PowerAdviser Flow

Posted by Ken Cheung in Design Flow on Wednesday, January 20, 2010

Calypto Design Systems introduced a new PowerAdviser Flow. The new flow enables designers to deliver power-optimized SoC designs. Using sequential design information generated by Calypto’s PowerPro CG and PowerPro MG tools, the PowerAdviser Flow provides users with specific design changes that can be manually implemented in their RTL code to reduce power.

SMIC-Cadence 65nm Low Power Reference Flow 4.0

Posted by Ken Cheung in Design Flow on Thursday, October 29, 2009

Cadence Design Systems introduced a comprehensive low-power design flow for engineers targeting the 65-nanometer process at Semiconductor Manufacturing International Corporation (SMIC). Based on the Cadence Low-Power Solution, the flow enables faster design of leading-edge, low-power semiconductors using a single, comprehensive design platform. The SMIC-Cadence Reference Flow 4.0 addresses the need for power-efficient design innovation with [...]

Calypto Sequential Optimization Flow

Posted by Ken Cheung in Design Flow on Monday, July 27, 2009

Calypto Design Systems unveiled a fully automated design flow for advancing the delivery of optimized, high-performance IP blocks for SoC designs. The Sequential Optimization Flow features Calypto’s SLEC RTL tool and new analysis capabilities of the PowerPro CG (clock gating) tool. With Calypto’s Sequential Optimization Flow, designers can use a fully automated flow to optimize [...]

Magma Talus-based Low-Power Reference Flow for SMIC 65nm Processes

Posted by Ken Cheung in Design Flow,Foundry on Friday, July 24, 2009

Magma Design Automation unveiled a low-power Talus-based IC implementation reference flow for the 65-nanometer process and low-leakage-process intellectual property (IP) from Semiconductor Manufacturing International Corporation (SMIC). Talus enables designers to address power considerations throughout the flow and within a single environment. Using Talus, SMIC customers can get the best combination of performance, low power and [...]

Mentor Graphics Expanded Solution for TSMC Reference Flow 10.0

Posted by Ken Cheung in Design Flow,Foundry on Thursday, July 23, 2009

Mentor Graphics has expanded their set of tools and technologies included in the TSMC Reference Flow 10.0. The expanded Mentor track supports advanced functional verification for complex ICs, netlist-to-GDSII implementation for 28nm ICs, tighter integration with the ubiquitous Calibre physical verification and DFM platform, and tools for layout aware test failure diagnosis. The improved Mentor [...]

Catapult-SpyGlass ESL-to-RTL Power Optimization Flow

Posted by Ken Cheung in Design Flow on Wednesday, July 15, 2009

Atrenta and Mentor Graphics teamed together on an high-level synthesis power optimization flow. The collaboration between the two companies has resulted in an interface between Mentor’s Catapult C Synthesis high-level synthesis tool and Atrenta’s SpyGlass-Power RTL power estimation and reduction tool to automate multi-level clock gating. The RTL output from Catapult is seamlessly handed off [...]

1Team Genesis Reference Flow for Automated SoC Assembly

Posted by Ken Cheung in Design Flow on Tuesday, July 7, 2009

Atrenta, Sonics, and Denali Software are building a reference flow based on Atrenta’s 1Team-Genesis automated chip assembly product. The flow will facilitate a healthy eco-system of semiconductor intellectual property (IP) that is qualified and ready to use in automated system-on-chip (SoC) assembly. The collaboration enables IP suppliers to ensure seamless integration of their IP portfolio [...]

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