'Foundry' Category Archive

SMIC 45nm GP Process

Posted by Ken Cheung in Foundry on Tuesday, June 30, 2009

Semiconductor Manufacturing International Corporation (SMIC) has successfully completed their first 45-nanometer high performance (GP, generic process with high performance) yield lot. The high-speed, high performance 45nm GP technology integrates a silicon germanium stress module into the design. The process enables the device to run faster and make it ideal for system-on-chip, graphics and network processors, [...]

SMIC and Synopsys Reference Flow 4.0

Posted by Ken Cheung in Design Flow, Foundry on Tuesday, June 23, 2009

Synopsys and Semiconductor Manufacturing International Corporation (SMIC) introduced version 4.0 of their 65-nanometer (nm) RTL-to-GDSII reference design flow. The reference flow features support for the Synopsys Eclypse Low Power Solution and IC Compiler Zroute technology. The joint solution gives IC engineering teams a proven reference flow to advance SoC designs targeting SMIC’s 65nm process technology [...]

X-FAB XH018 0.18 Micrometer CMOS Process for Integrated Hall Sensors

Posted by Ken Cheung in Foundry on Wednesday, June 10, 2009

X-FAB Silicon Foundries developed the first foundry process for the production of integrated Hall sensor ICs in 0.18 micrometer technology. The XH018 low-power CMOS process enables the combination of Hall sensor elements with high-voltage devices and Non-Volatile Memory (NVM) options. X-FAB’s XH018 technology for integrated Hall sensor solutions is available today. It comes with comprehensive [...]

LFoundry Process Design Kit for Tanner AMS Electronic Design Software

Posted by Ken Cheung in Foundry on Thursday, June 4, 2009

LFoundry introduced a process design kit (PDK) for A/MS electronic designs. The PDK was developed using Tanner EDA’s HiPer Silicon™ software. LFoundry is providing Tanner EDA users with the LF150 modular 0.15 µm Low Power and RF CMOS process that features up to six levels of aluminium interconnect, a polymide passivation and I/O voltages of [...]

TSMC iRCX Electronic Design Automation Data Format

Posted by Ken Cheung in Foundry on Friday, May 29, 2009

Taiwan Semiconductor Manufacturing Company announced the iRCX interoperable electronic design automation (EDA) data format for TSMC 65nm and 40nm processes. iRCX format unifies interconnect modeling data delivery, ensures data integrity and interpretation. EDA tools which support iRCX format will be able to receive accurate interconnect modeling data from the iRCX files developed and supported by [...]

SMIC 65-nanometer Low Leakage Process IP Portfolio

Posted by Ken Cheung in Foundry, IP Cores on Friday, May 15, 2009

Semiconductor Manufacturing International Corporation (SMIC) announced a set of 65-nanometer low leakage process IPs. SMIC’s new 65nm IPs includes a set of six memory compilers, which enable the intelligent and rapid generation of memory blocks in bulk and on the fly. The compilers feature memories optimized for very high performance and also optimized for performance [...]

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