Cadence and GLOBALFOUNDRIES In-Design DRC+ Verification Flow

Cadence Design Systems and GLOBALFOUNDRIES teamed together to reduce the turnaround time for design-for-manufacturing (DFM) signoff at 28 nanometers. Their verification flow features Cadence in-design DFM technology and GLOBALFOUNDRIES DRC+ methodology. The in-design DRC+ verification flow enables engineers to find and fix potential lithography hotspot problems that could reduce yield or even threaten viability of complex chip designs headed for manufacturing.

Cadence and GLOBALFOUNDRIES Verification Flow Highlights

  • Cadence ‘In-Design’ DFM approach
  • GLOBALFOUNDRIES DRC+ methodology
  • Reduces turnaround time for design-for-manufacturing (DFM) signoff at 28 nanometers
  • Enables engineers to find and fix potential lithography hotspot problems
  • Successfully used on several 32- and 28-nanometer production IC designs
  • Leading technology companies have successfully applied the in-design DRC+ flow using the silicon-validated 28-nanometer pattern library from GLOBALFOUNDRIES
  • The core of the DRC+ flow is the two-dimensional shape-based pattern matching
  • Moves traditional DFM steps into digital and custom implementation
  • Rambus reported a 60 times speedup of DFM signoff

More info: Cadence Design Systems