WIN/AWR Process Design Kit for H2W PH50-00 GaAs Foundry Process
AWR and WIN Semiconductors introduced the WIN/AWR H2W PH50-00 process design kit (PDK). The PDK for the WIN PH50-00 GaAs enhancement / depletion-mode pseudomorphic high electron mobility transistor (pHEMT) and heterojunction bipolar transistor (HBT) foundry process is the latest in AWR’s series of PDKs available for monolithic microwave integrated circuit (MMIC) designers. The AWR/WIN PH50-00 PDK is available now for use within AWR’s Microwave Office v2009 software. All AWR/WIN PDKs are distributed by WIN Semiconductor and available free of charge to qualifying customers.
WIN PH50-00 is a high-frequency, high-power MMIC process that has been in production since 2007. Until now, PDKs and design tools have lacked the technology needed to take full advantage of the advanced features in the process. However, the new WIN/AWR PDK fully exploits the process along with the latest version of Microwave Office software (v2009), as well as AWR’s ACE automatic circuit extraction technology, AXIEM 3D planar electromagnetic simulator, and APLAC multi-rate harmonic balance (MRHB) simulator. The WIN/AWR PP50-00 PDK can be resident in Microwave Office software simultaneously with packaging and other foundry PDKs to provide a complete module co-design environment.
The latest WIN/AWR PDK provides customers with the most accurate models available for pHEMT and HBT process technologies. The process is ideal for the most complex, functionally-dense MMICs. The AWR/WIN PH50-00 PDK enables designers to embrace the full potential of the PH50-00 process.
More info: WIN Semiconductors | AWR
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