Semiconductor Manufacturing International Corporation (SMIC) has successfully completed their first 45-nanometer high performance (GP, generic process with high performance) yield lot. The high-speed, high performance 45nm GP technology integrates a silicon germanium stress module into the design. The process enables the device to run faster and make it ideal for system-on-chip, graphics and network processors, telecommunications, and wireless consumer products. SMIC’s 45nm GP technology is supported by a proven design-in SPICE model and in-house design IP capability that enables customers to begin prototype product design and plan for early time-to-market.
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