Advanced Equipment Control / Advanced Process Control Symposium

The Advanced Equipment Control / Advanced Process Control (AEC/APC) Symposium will be held October 4-8 at the Cliff Lodge at Snowbird in Salt Lake City, Utah. Chip manufacturing productivity experts and suppliers will attend the symposium to discuss recent technical advancements in advanced equipment and process control as well as to review SEMI standards and consistency with the International Technology Roadmap for Semiconductors.

AEC/APC Symposium Sessions

  • Fault Detection and Classification
  • Run-to-Run Control
  • Applications in High Volume Mfg
  • Standards and Strategies
  • Model-Based Control
  • Metrology and Sensors

AEC/APC Symposium Highlights

  • Keynote speeches from James Moyne, Applied Materials, Alan Weber, Alan Weber & Associates, Inc. and Thomas Mueller, PEER Group GmbH, the industry’s foremost experts on advanced equipment and process control
  • Anthony Toprac, a widely recognized expert in the area of advanced equipment control, will lead the symposium short course, entitled “Introduction to Advanced Run-to-Run and Fault Detection Control in Semiconductor Manufacturing” (October 4)
  • Two half-day tutorials, entitled “Practical Aspects of Batch Process Monitoring” and “Multivariate Analysis for Microelectronics Manufacturing: the Right Tools for the Job,” will take place on October 5
  • In-depth technical papers, presented by IC manufacturers, suppliers, and universities, covering fault detection and classification, run-to-run and model-based control, metrology and sensors, standards and strategies and applications in high volume manufacturing
  • A product exhibition, with informative displays from suppliers of software, parts, and factory equipment for automation, processing, metrology and control.
    A robust set of poster sessions on topics augmenting the conference sessions

More information: AEC/APC Symposium