Xyalis recently introduced GTmask, which is a fully integrated environment dedicated to complex wafer masks building. GTmask offers capabilities that meet mask teams’ demands, covering wafer assembly and floorplanning for chip arrays, multi-project wafers and multi-layer reticles; CMP metal filling; automatic frame generation; and optimized GDSII and jobdeck files generation. GTmask is built upon Xyalis’ wafer floorplanning and assembly tool (GTmuch), a solution able to place hundreds of chips in minutes, which addresses three main steps in mask building: MPW assembly, CMP fill, and frame generation.
Multi-project multi-layer assembly module
Xyalis’ high end assembly tool handles the complete set of mask layers of a chip; OASIS layers as well as GDSII layers; multi-project wafers (assembling multiple GDSII/OASIS databases from different designs on one wafer); any scale reticles (2.5X, 4X, 5X); and multi-layer reticles (placing different layers of a same design onto a single reticle, with automatic matricing).
To increase manufacturability regarding the chemical-mechanical planarization process step (CMP), an option to fill empty spaces with dummy tiles is also available. Dummy cells are customizable, as are insertion rules. Dummy cells come as single OASIS/GDSII files, or as multiple files with jobdeck files (placement directives for mask writing tools).
The new GTframe module automatically inserts process and mask specific items (test structures, alignment marks or any GDSII files), for both regular chip arrays and MPWs. Automatic frame instantiation is also available for reticles, with the possibility to use mask templates. Barcodes or titles are also inserted into the scribe lines, between the chips of an MPW project or around the reticles.
OASIS, MEBES compatibility
The final data can be generated either as a single database or as multiple databases plus a standard jobdeck file. The split of the final database can be adjusted to offer the best compromise between jobdeck complexity and files size. To meet new demands from the semiconductor world, Xyalis tools now handle both classical GDSII and newer OASIS chip layout database formats. The GTmask tool suite is also able to read and write files in the MEBES mask writing format. This makes it easy to include GTmask into existing flows.
Linking technical and administrative mask databases
One of the key benefits of the GTmask tool suite is the safe handling of large databases, including process description, imported and merged GDSII databases validation, and layer management for complex MPWs and MLRs. The next step will be to establish a direct link with SQL databases for mask management and ordering applications.
More info: Xyalis