International Business Machines Corporation (NYSE: IBM) and Hitachi, Ltd. (NYSE: HIT) (TSE: 6501) are teaming together for semiconductor metrology research. The goal of their partnership is to speed the pace of semiconductor innovation. This the first time Hitachi and IBM have collaborated on semiconductor technology. IBM and Hitachi, through this collaborative research, intend to investigate the possibilities for even further transistor scaling.
Miniaturization of transistors, a driving force in improving the performance of computer chips, is being aggressively pursued in the development of next-generation 32 and 22-nanometer devices. The feature size of such minute devices is in the realm of billionths of a meter, and effects at this scale can have a large impact on the electrical characteristics of individual transistors.
The new collaboration will focus on 32nm and beyond semiconductor research and will use new methods that include the latest technologies to analyze semiconductor devices and structures in order to improve the characterization and measurement of transistor variation — as well as to develop a better understanding of device physics. Engineers from the two companies and Hitachi’s subsidiary, Hitachi High-Technologies, will conduct joint research at IBM’s Thomas J. Watson Research Center in Yorktown Heights, N.Y. and at the College of Nanoscale Science and Engineering’s Albany NanoTech Complex.