International Symposium on Ultra-Clean Processing of Semiconductor Surfaces
IMEC has issued a call for papers for their International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), which takes place on September 22-24, 2008 in the Oud Sint-Jan, conference center in Brugge. UCPSS examines ultra-clean processing technology in all steps of IC-production. The conference consists of invited presentations, as well as selected contributing presentations and posters. Issues addressed include, but are not limited to, the following topics:
- Surface conditioning for sensitive processes (e.g. high-k dielectrics, Ge surfaces)
- Chemical and physical cleaning in liquid, gaseous and supercritical ambient
- Trade-offs between cleaning performance, substrate damage and etching
- Application-specific cleans (e.g. epitaxy, SiGe, CVD, wafer backside)
- Cleaning and surface treatments at the interconnect level, cleaning of low-k material, post-CMP cleaning
- Dry-etch resist strip and polymer removal
- Contamination/particle control and its relation with process performance
- Controlled environment during processing, equipment for wafer cleaning
- Surface chemistry, passivation, and characterization of Si, Ge, and GaAs
- Effects of Si-wafer defects and Si-surface topography on process yield
- Process and contamination diagnostics, in-situ monitoring and process control
- General issues in ultra-clean technology, ultra-pure materials and supply systems
- Environmentally friendly technologies and mass balance equations
Contributing authors should submit a 2-page abstract for evaluation on or before Monday, March 31, 2008. Accepted manuscripts will be published in the conference proceedings.
Ultra-Clean Processing of Semiconductor Surfaces
Oud Sint-Jan Conference Center, Brugge, Belgium
September 21-24, 2008
ucpss@momentum-pco.be
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