International Symposium on Ultra-Clean Processing of Semiconductor Surfaces

IMEC has issued a call for papers for their International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), which takes place on September 22-24, 2008 in the Oud Sint-Jan, conference center in Brugge. UCPSS examines ultra-clean processing technology in all steps of IC-production. The conference consists of invited presentations, as well as selected contributing presentations and posters. Issues addressed include, but are not limited to, the following topics:

  • Surface conditioning for sensitive processes (e.g. high-k dielectrics, Ge surfaces)
  • Chemical and physical cleaning in liquid, gaseous and supercritical ambient
  • Trade-offs between cleaning performance, substrate damage and etching
  • Application-specific cleans (e.g. epitaxy, SiGe, CVD, wafer backside)
  • Cleaning and surface treatments at the interconnect level, cleaning of low-k material, post-CMP cleaning
  • Dry-etch resist strip and polymer removal
  • Contamination/particle control and its relation with process performance
  • Controlled environment during processing, equipment for wafer cleaning
  • Surface chemistry, passivation, and characterization of Si, Ge, and GaAs
  • Effects of Si-wafer defects and Si-surface topography on process yield
  • Process and contamination diagnostics, in-situ monitoring and process control
  • General issues in ultra-clean technology, ultra-pure materials and supply systems
  • Environmentally friendly technologies and mass balance equations

Contributing authors should submit a 2-page abstract for evaluation on or before Monday, March 31, 2008. Accepted manuscripts will be published in the conference proceedings.

Ultra-Clean Processing of Semiconductor Surfaces
Oud Sint-Jan Conference Center, Brugge, Belgium
September 21-24, 2008
ucpss@momentum-pco.be